Heidelberg MLA150

The Heidelberg MLA150 is a direct write lithography tool located in SHyNE Resource’s Pritzker Nanofabrication Facility (PNF) at The University of Chicago. The Heidelberg MLA150 uses ultraviolet light to pattern substrates with a light-sensitive polymer, called a photoresist. Those patterns can be further transferred to the substrate by adding or removing material. By creating multiple Read More…