- Capillary tube xrd
- Thin-film xrd
- Liquid and slurry samples
- 1-D high speed detector, 100 deg/minute
- Grazing incidence XRD
- X-ray Reflectivity
- Pole figures
- Medium and High Resolution XRD
- High intensity Cu rotating anode generator with multilayer optic.
- (NU users $20/hr, $50/hr non-NU users)
PVD PLD/MBE 2300 with high pressure RHEED capabilities
- A duel position load lock minimizes pump down times to ~15 minutes between depositions.
- The target-to-substrate separation is adjustable between 50 mm and 100 mm
- RHEED capabilities allow the characterization of film growth. Two-stage differential pumping permits the RHEED to be used up to 200 mTorr pressure
- An inductively coupled 13.65MHz RF generator can be used to create a plasma in the vicinity of the substrate for either in situ pre-cleaning of the substrate for plasma assisted deposition
- Both oxygen and nitrogen are currently available for plasma processing and deposition